High frequency sputtering machine
Description:
Grow mono and multilayer thin films
Specification:
- Highest vacuum level: 10-6Torr
- 2 substrates, 1 sputtering source 400W
- We have added 18 targets serving the investigation and growth mono, multilayer thin film or alloys
- Manufacturer: Alcatel, France
- Year of manufacture: 1980, installation and use 1996
- Code name: SCM 400
Contact: Ass Prof. Dr. Nguyen Anh Tuan
Keywords: sputtering, mono thin films, multilayer thin films, SCM 400, Alcatel, France.
